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Kazuto Arakawa, Shigeo Arai, Hiroshi Orihara, Kotaro Ono, Michio Kiritani, A study of the mechanism of the growth and shrinkage of stacking fault tetrahedra using the fluctuation of their size under electron irradiation, Journal of Electron Microscopy, Volume 51, Issue suppl_1, 27 March 2002, Pages S225–S229, https://doi.org/10.1093/jmicro/51.Supplement.S225
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Abstract
The growth and shrinkage processes of stacking fault tetrahedra (SFT) are examined using the phenomenon of the temporal fluctuation of the size of small SFT, below 3 nm in edge length, by the temporal and spatial fluctuation of point defect reactions under high‐energy electron irradiation. Electron irradiation of pure copper and simultaneous observation is performed with a high‐voltage electron microscope. The behaviour of SFT under electron irradiation is recorded with a videotape recorder through a camera tube. By the analysis of time series of the size of each SFT, support is given to the mechanism that SFT grow or shrink by the nucleation of ledges and their propagation on the SFT faces. The absorption rate of each type of point defect by SFT is also evaluated by Brownian‐type analysis. The absorption rate increases with the rise in temperature. The total cross‐section for the capture of point defects by a SFT is estimated to be about 500 for each type of point defect.