Fig. 3
Top view field emission scanning electron micrographs (a–d) and atomic force microscopy images (e–h) of CuO thin films prepared using various Cu concentrations: a and e, parent glass; b and f, 0.2 mol % Cu; c and g, 0.3 mol % Cu; d and h, 0.4 mol % Cu. The insets (cross-sectional views) show the thickness of the CuO thin films on the glass substrates

Top view field emission scanning electron micrographs (ad) and atomic force microscopy images (eh) of CuO thin films prepared using various Cu concentrations: a and e, parent glass; b and f, 0.2 mol % Cu; c and g, 0.3 mol % Cu; d and h, 0.4 mol % Cu. The insets (cross-sectional views) show the thickness of the CuO thin films on the glass substrates

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