Figure 5.
Site-specific DNA damage was observed by photolysis of N-OHAAF in 23mer single-stranded DNA and double-stranded DNA fragment. Reaction mixtures containing the HEX-5′-end labeled 23mer single-stranded DNA (0.4 μM) and double-stranded DNA (0.4 μM) fragment and indicated concentration of N-OHAAF. All reactions were conducted in PB (100 mM, pH 7.4) under dark or UV irradiation (1.5 mW/cm2 at 313 nm) for 10 min at room temperature.
